- 2 publications
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Quantifying the effect of nanosheet dimensions on the piezoresistive response of printed graphene nanosheet networks
E. Caffrey, J. M. Munuera, T. Carey, J. N. Coleman
Nanoscale Horiz., 2024, 9, 1774–1784. Link to article (open access).
Printed networks of 2D nanosheets have found a range of applications in areas including electronic devices, energy storage systems and sensors. For example, the ability to print graphene networks onto flexible substrates enables the production of high-performance strain sensors. The network resistivity is known to be sensitive to the nanosheet dimensions which implies the piezoresistance might also be size-dependent. In this study, the effect of nanosheet thickness on the piezoresistive response of nanosheet networks has been investigated. To achieve this, we liquid-exfoliated graphene nanosheets which were then subjected to centrifugation-based size selection followed by spray deposition onto flexible substrates. The resultant devices show increasing resistivity and gauge factor with increasing nanosheet thickness. We analyse the resistivity versus thickness data using a recently reported model and develop a new model to fit the gauge factor versus thickness data. This analysis allowed us to differentiate between the effect of strain on inter-nanosheet junctions and the straining of the individual nanosheets within the network. Surprisingly, our data implies the nanosheets themselves to display a negative piezo response.
Defect Engineering of MoTe2 via Thiol Treatment for Type III van der Waals Heterojunction Phototransistor
Y. Jeong, B. Han, A. Tamayo, N. Claes, S. Bals, P. Samorì
ACS Nano, 2024, 18, 18334–18343. Link to article (open access).
Molybdenum ditelluride (MoTe2) nanosheets have displayed intriguing physicochemical properties and opto-electric characteristics as a result of their tunable and small band gap (Eg ∼ 1 eV), facilitating concurrent electron and hole transport. Despite the numerous efforts devoted to the development of p-type MoTe2 field-effect transistors (FETs), the presence of tellurium (Te) point vacancies has caused serious reliability issues. Here, we overcome this major limitation by treating the MoTe2 surface with thiolated molecules to heal Te vacancies. Comprehensive materials and electrical characterizations provided unambiguous evidence for the efficient chemisorption of butanethiol. Our thiol-treated MoTe2 FET exhibited a 10-fold increase in hole current and a positive threshold voltage shift of 25 V, indicative of efficient hole carrier doping. We demonstrated that our powerful molecular engineering strategy can be extended to the controlled formation of van der Waals heterostructures by developing an n-SnS2/thiol-MoTe2 junction FET (thiol-JFET). Notably, the thiol-JFET exhibited a significant negative photoresponse with a responsivity of 50 A W–1 and a fast response time of 80 ms based on band-to-band tunneling. More interestingly, the thiol-JFET displayed a gate tunable trimodal photodetection comprising two photoactive modes (positive and negative photoresponse) and one photoinactive mode. These findings underscore the potential of molecular engineering approaches in enhancing the performance and functionality of MoTe2-based nanodevices as key components in advanced 2D-based optoelectronics.